플라즈마 에칭공정에 따른 산화물 박막의 광촉매 표면 특성   플라즈마 에칭공정에 따른 산화물 박막의 광촉매 표면 특성
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상세내용
저자 이창현, 서성보, 오지용, 진익현, 손선영, 김화민     
수록지 전기전자재료학회논문지   제28권 제5호  pp.300-305
발행사항 한국전기전자재료학회
발행년 2015
UCI G901:A-0003731752    공유
DOI http://dx.doi.org/10.4313/JKEM.2015.28.5.300
언어 kor
주제어 Water contact angle, Roughness factor, Plasma etching, UV illumination, Super-hydrophilic
초록 WO₃, SiO₂, and TiO₂films with hydrophilic property are deposited by rf-magnetron sputtering. Their wettability is strongly depends on the presence or absence of the oxygen plasma etching on the glass substrates. The TiO₂film of 50 nm-thick on the plasma etched glass shows a water contact angle (WCA) below 5°which means a super-hydrophilic surface. However, WCA values are gradually degraded when the films are exposed under atmosphere, especially WO₃. In order to improve hydrophilic property, the degraded films can be again recovered by UV illumination for 10 sec using UV-light and the TiO₂film shows a super-hydrophilic surface about 3°.
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