TY - JOUR
TI - 플라즈마 에칭공정에 따른 산화물 박막의 광촉매 표면 특성
AU - 김화민
AU - 서성보
AU - 손선영
AU - 오지용
AU - 이창현
AU - 진익현
JO - 전기전자재료학회논문지
VL - 제28권 제5호
SP - 300
EP - 305
PY - 2015
| 저자 | 이창현, 서성보, 오지용, 진익현, 손선영, 김화민 | ||
|---|---|---|---|
| 수록지 | 전기전자재료학회논문지 제28권 제5호 pp.300-305 | ||
| 발행사항 | 한국전기전자재료학회 | ||
| 발행년 | 2015 | ||
| UCI | G901:A-0003731752 공유 | ||
| DOI | http://dx.doi.org/10.4313/JKEM.2015.28.5.300 | ||
| 언어 | kor | ||
| 주제어 | Water contact angle, Roughness factor, Plasma etching, UV illumination, Super-hydrophilic | ||
| 초록 | WO₃, SiO₂, and TiO₂films with hydrophilic property are deposited by rf-magnetron sputtering. Their wettability is strongly depends on the presence or absence of the oxygen plasma etching on the glass substrates. The TiO₂film of 50 nm-thick on the plasma etched glass shows a water contact angle (WCA) below 5°which means a super-hydrophilic surface. However, WCA values are gradually degraded when the films are exposed under atmosphere, especially WO₃. In order to improve hydrophilic property, the degraded films can be again recovered by UV illumination for 10 sec using UV-light and the TiO₂film shows a super-hydrophilic surface about 3°. | ||
| 원문보기 | KISTI 원문 | ||